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        <datestamp>2026-09-28T23:03:21Z</datestamp>
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          <dc:title>Supramolecularly
Directed Area-Selective Photo-Cross-Linking
of Block Copolymers for Robust Nanostructures</dc:title>
          <dc:creator>Shabari Dutta (23796712)</dc:creator>
          <dc:creator>Shaghayegh Abtahi (18257462)</dc:creator>
          <dc:creator>Chizoba Livina Iheme (25133470)</dc:creator>
          <dc:creator>Nayanathara Hendeniya (18257453)</dc:creator>
          <dc:creator>Sharif Tasnim Mahmud (22215152)</dc:creator>
          <dc:creator>Colin R Porter (25133473)</dc:creator>
          <dc:creator>Alexandra Kuhlman Schneider (23796718)</dc:creator>
          <dc:creator>Boyce Chang (4025012)</dc:creator>
          <dc:subject>Biochemistry</dc:subject>
          <dc:subject>Space Science</dc:subject>
          <dc:subject>Physical Sciences not elsewhere classified</dc:subject>
          <dc:subject>Biotechnology</dc:subject>
          <dc:subject>Environmental Sciences not elsewhere classified</dc:subject>
          <dc:subject>Chemical Sciences not elsewhere classified</dc:subject>
          <dc:subject>Immunology</dc:subject>
          <dc:subject>Biological Sciences not elsewhere classified</dc:subject>
          <dc:subject>Infectious Diseases</dc:subject>
          <dc:subject>swelling studies showed</dc:subject>
          <dc:subject>combined findings establish</dc:subject>
          <dc:subject>supramolecularly directed area</dc:subject>
          <dc:subject>cinnamic acid selective</dc:subject>
          <dc:subject>layer multilayer architectures</dc:subject>
          <dc:subject>bcp microphase separation</dc:subject>
          <dc:subject>directed self</dc:subject>
          <dc:subject>selective photo</dc:subject>
          <dc:subject>versatile platform</dc:subject>
          <dc:subject>versatile method</dc:subject>
          <dc:subject>study introduces</dc:subject>
          <dc:subject>robust nanostructures</dc:subject>
          <dc:subject>ps -&lt;</dc:subject>
          <dc:subject>p4vp block</dc:subject>
          <dc:subject>multifunctional coatings</dc:subject>
          <dc:subject>morphological reconstruction</dc:subject>
          <dc:subject>layer nanofabrication</dc:subject>
          <dc:subject>induced photocycloaddition</dc:subject>
          <dc:subject>grayscale lithography</dc:subject>
          <dc:subject>fabricate layer</dc:subject>
          <dc:subject>block copolymers</dc:subject>
          <dc:subject>bcp film</dc:subject>
          <dc:subject>b &lt;/</dc:subject>
          <dc:description>This study introduces
a versatile method for fabricating
cross-linked,
hierarchically ordered multilayer nanostructures from PS-&lt;i&gt;b&lt;/i&gt;-P4VP block copolymer (BCP) films. The approach combines supramolecular
hydrogen bonding of cinnamic acid selective to the P4VP block, followed
by UV-induced photocycloaddition to form truxillic acid cross-links.
Efficient cross-linking was achieved under low UV-irradiance that
resulted in densified films with excellent film retention (∼99%).
Swelling studies showed that the BCP film is solvent-stable and exhibits
limited swelling despite domain-selective cross-linking. Interestingly,
the
non-cross-linked domains remain available for solvent uptake, leading
to morphological reconstruction. These solvent-stable films were further
used to fabricate layer-by-layer multilayer architectures while preserving
the laterally ordered nanoscale morphologies generated by BCP microphase
separation. The combined findings establish a versatile platform that
integrates block copolymer self-assembly with layer-by-layer nanofabrication,
providing tunable multilayer nanostructures for applications in grayscale
lithography, membranes, directed self-assembly, and multifunctional
coatings.</dc:description>
          <dc:date>2026-09-28T00:00:00Z</dc:date>
          <dc:type>Text</dc:type>
          <dc:type>Journal contribution</dc:type>
          <dc:identifier>10.1021/acsapm.6c03397.s001</dc:identifier>
          <dc:relation>https://figshare.com/articles/journal_contribution/Supramolecularly_Directed_Area-Selective_Photo-Cross-Linking_of_Block_Copolymers_for_Robust_Nanostructures/34018633</dc:relation>
          <dc:rights>CC BY-NC 4.0</dc:rights>
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