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          <dc:title>Data for Atomic layer deposition of hafnium oxide passivating layers on silicon : impact of precursor selection</dc:title>
          <dc:creator>Sophie L. Pain (25017316)</dc:creator>
          <dc:creator>Anup Yadav (25017658)</dc:creator>
          <dc:creator>David Walker (36297)</dc:creator>
          <dc:creator>Nicholas E. Grant (6877136)</dc:creator>
          <dc:creator>John D. Murphy (25017325)</dc:creator>
          <dc:subject>Hafnium</dc:subject>
          <dc:subject>Hafnium oxide</dc:subject>
          <dc:subject>Atomic layer deposition</dc:subject>
          <dc:subject>Surface chemistry</dc:subject>
          <dc:subject>Silicon -- Surfaces</dc:subject>
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