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          <dc:title>Supplementary material</dc:title>
          <dc:creator>Zain Ul Abdin (19200667)</dc:creator>
          <dc:creator>Rajendra Kumar (1773094)</dc:creator>
          <dc:creator>Govardan Gopakumar (19200664)</dc:creator>
          <dc:creator>Michael Manfra (19200670)</dc:creator>
          <dc:creator>Oana Malis (2009857)</dc:creator>
          <dc:subject>Physical sciences</dc:subject>
          <dc:subject>molecular beam epitaxy</dc:subject>
          <dc:subject>intersubband transitions</dc:subject>
          <dc:description>The supplementary material file provides material parameters used in the nextnano++ simulations of ScAlN/GaN band-structure, equations for the ISB absorption and calculated values of the dipole matrix element. Figure S1 shows the effect of interdiffusion on the band structure of a Sc0.14Al0.86N/GaN (6 nm/6 nm) QW. Figure S2 shows the composition profiles for 1 nm and 2 nm Sc0.14Al0.86N/GaN QWs assumed in the proposed simplified model of interdiffusion.</dc:description>
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