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          <dc:title>Data for Defect dynamics in self-catalyzed III-V semiconductor nanowires</dc:title>
          <dc:creator>James A. Gott (5746952)</dc:creator>
          <dc:creator>Richard Beanland (768962)</dc:creator>
          <dc:creator>H. Aruni Fonseka (1658170)</dc:creator>
          <dc:creator>Jonathan J. P. Peters (3777724)</dc:creator>
          <dc:creator>Yunyan Zhang (1269093)</dc:creator>
          <dc:creator>Huiyun Liu (845957)</dc:creator>
          <dc:creator>Ana M. Sánchez (2439316)</dc:creator>
          <dc:subject>Nanowires</dc:subject>
          <dc:subject>Compound semiconductors</dc:subject>
          <dc:subject>Semiconductors -- Defects</dc:subject>
          <dc:subject>Nanotechnology</dc:subject>
          <dc:subject>Migrated from ePrints</dc:subject>
          <dc:description>The droplet consumption step in self-catalyzed III-V semiconductor nanowires can produce material that contains a high density of line defects. Interestingly, these defects are often associated with twin boundaries and have null Burgers vector, i.e. no long-range strain field. Here we analyze their stability by considering the forces that act on them and use in-situ aberration corrected scanning transmission electron microscopy (STEM) to observe their behavior in GaAsP NWs using short annealing cycles. Their movement appears to be consistent with the thermally-activated single- or double-kink mechanisms of dislocation glide, with velocities that do not exceed 1 nm s-1. We find that motion of individual defects depends on their size, position, and surrounding environment and set an upper limit to activation energy around 2eV. The majority of defects (&gt;70%) are removed by our post-growth annealing for several seconds at temperatures in excess of 640 °C, suggesting that in-situ annealing during growth at lower temperatures would significantly improve material quality. The remaining defects do not move at all and are thermodynamically stable in the nanowire.&lt;br&gt;&lt;br&gt;Electron microscope images and data in formats .dm4, .xlsx, .tif, .png, .avi and .mp4. Filenames as follows are individually available for download:  1a.dm4: ADF STEM image of a nanowire with defective tip. 1b.dm4: ADF STEM image of a twin bounded by two Σ3 {112} twin facets. 2d.xlsx: Data for forces acting on a 3ML defect. 3a.xlsx: Data for number of moving and stationary defects after heating cycles. 3b.xlsx: Data for histogram of velocity values measured for different temperatures. 3b-i1.dm4: BF STEM image of a nanowire with defective tip. 3b-i2.dm4: BF STEM image of a nanowire with defective tip. 3b-i3.dm4: BF STEM image of a nanowire with defective tip. 4b.dm4: ADF STEM image of a 3ML defect in the process of moving. 4c.dm4: ADF STEM image of a 3ML defect in the process of moving. 4d.dm4: ADF STEM image of a region after the defect has been removed.  5a.dm4: ADF STEM image of a 3ML defect in the process of moving. 5b.dm4: ADF STEM image of a 3ML defect in the process of moving. 5c.dm4: ADF STEM image of a 3ML defect in the process of moving. 5d.dm4: ADF STEM image of a 3ML defect in the process of moving. 5e.xlsx: Data of defect positions after different heat cycles. 5f.xlsx: Data of defect velocities for different temperatures. s2a.tif: SEM image of nanowires on substrate. s2b.tif: SEM side image of nanowires with defective tips. s3a.xlsx: Data of defect positions after different heat cycles. s3b.xlsx: Data of defect velocities for different temperatures. s5a.dm4: ADF STEM image of 3ML type defects in a nanowire. s5b.dm4: ADF STEM image of 3ML type defects in a nanowire. s5c.dm4: ADF STEM image of 3ML type defects in a nanowire. s5d.dm4: ADF STEM image of 3ML type defects in a nanowire. s6a.dm4: ADF STEM image of a nanowire with defective tip. s6b.xlsx: ADF intensity profile taken across the width of a nanowire.  s7a.dm4: ADF STEM image of a twin bounded by two Σ3 {112} twin facets. s8b.dm4: ADF STEM image of a 3ML defect in the process of moving. s8c.dm4: ADF STEM image of a 3ML defect in the process of moving. s8d.dm4: ADF STEM image of a 3ML defect in the process of moving. SI1a.png: Frame from movie of a nanowire with catalyst droplet attached before heating. SI1b.png: Frame from movie of a nanowire with catalyst droplet attached after heating. SI4.png: ADF STEM image of 3ML type defects in a nanowire. SuppMovie2-DefectMotion.avi: TEM video of a NW with catalyst droplet still attached being heated in situ and cooled and the formation of a defect observed. DefectForm3.mp4: ADF STEM video of observed defect motion</dc:description>
          <dc:date>2019-07-25T00:00:00Z</dc:date>
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          <dc:identifier>10.82444/warw.33782143.v1</dc:identifier>
          <dc:relation>https://figshare.com/articles/dataset/Data_for_Defect_dynamics_in_self-catalyzed_III-V_semiconductor_nanowires/33782143</dc:relation>
          <dc:rights>CC BY 4.0</dc:rights>
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