2026-10-13T08:01:48Z https://api.figshare.com/v2/oai

oai:figshare.com:article/33777424 2026-09-30T12:01:35Z category_36833 portal_1075 item_type_3 month_year_09_2026

Supplementary Material Somayeh Shams (16510601) Shail Shah (498825) Ingmar Ratschinski (20548835) Daniel Hiller (668767) Physical sciences Modulation Acceptor Doping Atomic Layer Deposition Silicon Doping Hall-effect Measurement Aluminum Oxide Additional information for manuscript "Influence of Al-precursor and Oxidant on the performance of ALD-Al2O3 ultra-thin films embedded in SiO2 for Modulation Acceptor Doping of Silicon" 2026-09-30T12:01:35Z Dataset Dataset 10.60893/figshare.apl.33777424.v1 https://figshare.com/articles/dataset/Supplementary_Material/33777424 CC BY 4.0