2026-10-06T08:56:11Z https://api.figshare.com/v2/oai

oai:figshare.com:article/33465886 2026-09-29T12:08:47Z category_32963 portal_1075 item_type_6 month_year_09_2026

Supplementary Material Yanan Li (94033) Leila Ghorbani (21143384) Philippe Bezard (13117571) Shreya Kundu (13117565) Yuchao Jiang (3964508) Xiaoyu Piao (23816701) Cassie Sheng (24724243) Katia Devriendt (3052395) Engineering Iridium etching Plasma etching Halogen plasma chemistry Plasma-surface interaction Supplementary material including pressure-dependence measurements, ion beam etching comparison experiments, TEM/EDS analysis under Cl₂-based plasma conditions, and XPS surface atomic concentrations. 2026-09-29T12:08:47Z Text Journal contribution 10.60893/figshare.jva.33465886.v1 https://figshare.com/articles/journal_contribution/Supplementary_Material/33465886 CC BY 4.0