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        <datestamp>2026-09-30T12:54:45Z</datestamp>
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          <dc:title>Supplementary Material: Area Selective Atomic Layer Deposition of ruthenium with pinacolborane as a small molecule inhibitor</dc:title>
          <dc:creator>Sundas Ismaeel (22332784)</dc:creator>
          <dc:creator>Heta-Elisa Nieminen (6837584)</dc:creator>
          <dc:creator>Mykhailo Chundak (9986311)</dc:creator>
          <dc:creator>Mikko Ritala (559215)</dc:creator>
          <dc:subject>Chemical sciences</dc:subject>
          <dc:subject>Ru thin ALD film</dc:subject>
          <dc:subject>area selective deposition of Ru</dc:subject>
          <dc:subject>small molecule inhibitor</dc:subject>
          <dc:description>. SEM images of different surfaces with 300 and 1000 ALD cycles
. Wide scan XPS spectrum of a Pt surface showing the lack of boron.&lt;p&gt;&lt;/p&gt;</dc:description>
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