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        <datestamp>2026-09-18T07:06:30Z</datestamp>
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          <dc:title>Exposure dose-dependent multi-tone photolithography via photoacid-induced crosslinking/degradation of poly(2,3-dihydrofuran)</dc:title>
          <dc:creator>Jun-Dan Huang (24493122)</dc:creator>
          <dc:creator>Xiao Tan (24493132)</dc:creator>
          <dc:creator>Jun Liu (24493134)</dc:creator>
          <dc:creator>Bo Zhao (24493135)</dc:creator>
          <dc:creator>Hong-Qiang Li (24493138)</dc:creator>
          <dc:creator>Ying-Yi Ren (24493140)</dc:creator>
          <dc:creator>Rui Tian (24493141)</dc:creator>
          <dc:creator>Yisi Xiong (24493144)</dc:creator>
          <dc:creator>Chong Li (24493146)</dc:creator>
          <dc:creator>Ming-Kui Wang (24493152)</dc:creator>
          <dc:creator>Shi-Li Xiang (24493161)</dc:creator>
          <dc:creator>Ming-Qiang Zhu (24493170)</dc:creator>
          <dc:subject>Macromolecular and Materials Chemistry not elsewhere classified</dc:subject>
          <dc:subject>Photoresist</dc:subject>
          <dc:subject>Poly(2,3-dihydrofuran)</dc:subject>
          <dc:subject>Multi-tone patterning</dc:subject>
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          <dc:date>2026-09-18T07:06:30Z</dc:date>
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