2026-10-12T13:25:18Z https://api.figshare.com/v2/oai

oai:figshare.com:article/31852669 2026-09-30T16:00:23Z category_37476 portal_1023 item_type_12 month_year_09_2026

Mie-lithography: void-resonance-assisted femtosecond laser printing for deep-ultraviolet to near-infrared nano dispersion devices Wei Gong (112494) Zhen-Ze Li (15346291) Chang Yu (237950) Zhen Wang (72451) Han-Yue Fan (23621485) Yi Wang (32470) Zhi-Hao Chen (688011) Chun-Qi Jin (22646711) Yu-Hao Lei (23621488) Qi-Dai Chen (1768729) Lei Wang (6656) Hong-Bo Sun (1459207) Physics (arXiv) physics.optics (arXiv) Nanoscale control of optical dispersion is essential for applications ranging from miniaturized spectrometers to color printing, all of which demand broadband spectral tunability. However, the Kramers-Kronig relations impose a fundamental trade-off between dispersion and loss, strictly limiting the design ability of single-material devices across the deep ultraviolet (DUV) to near-infrared (NIR) regimes. Consequently, the fabrication of miniaturized dispersion devices heavily relies on costly nanofabrication or heterogeneous integration. Here we overcome these limitations by shifting the light-matter interaction from solid structure into air-filled voids. We introduce a fabrication strategy termed "Mie-lithography", in which laser printed seed nanocavities excite Mie resonances in air and the resulting localized field enhancement drives the self-assembly of three-dimensionally tunable void-type optical resonators. Because the resonant modes are primarily confined within air voids, this architecture effectively alleviates material-imposed dispersion-loss constraints, allowing on-demand customization of the broadband spectral response. This approach could enable single-step, high-throughput (>= 10^6 pixels/s) printing of dispersion units with a resolution of 63,500 DPI. As a proof of concept, we demonstrate a single-material nano dispersion device for spectral encoding from 200 to 800 nm, with spectral reconstruction using a camera. Our approach can be extended into a platform for ultra-broadband (DUV-NIR) nano devices fabrication and design, opening avenues for high-pixel-density displays and miniaturized spectrometers. 2026-09-28T00:00:00Z Text Preprint 10.48550/arXiv.2603.22034 https://figshare.com/articles/preprint/Mie-lithography_self-guiding_nonlinear_laser_printing_for_deep_ultraviolet_to_near-infrared_nano_dispersion_devices/31852669 CC0